Ceramic Sputtering Target Zinc Sulfide Target Material

ZnS flat target material adopts vacuum hot pressing sintering process, which can be produced. The maximum diameter is 300mm, and the thickness is processed according to customer requirements.

• Density: 4.0g/cm³
• Purity: 99.99% - 99.999%

Widely used in:

• Semiconductor chips
• Terminal solar energy photovoltaics
• Flat panel displays
• Special coatings and other industries

Various ceramic target materials produced by vacuum hot pressing sintering method have advanced technology and mature production processes. The products are mainly used in fields such as:

• Thin-film solar energy
• Flat panel displays
• Optical coatings
• Semiconductors
• Military industry

The company has cooperated with many well-known universities at home and abroad, committed to the research and development of new materials and processes, and continues to provide various high-quality target material products and services to domestic and foreign customers.